网络社会信息安全保障技术研究

网络社会作为一种新型社会形态,是现实社会在网络空间中的延伸和反映,是随着信息技术不断发展而形成的一种新的社会形态。新信息技术的快速发展和普及,使其面临的信息安全问题也愈加突出。在对当前网络社会信息安全面临的问题和常用的安全保障技术分析的基础上,提出对网络进行网格化,并以网格为基础构建防护、监控和响应集成一体式技术保障体系,该方法可以把各网络的安全技术融合为一个整体来保障网络社会的的信息安全,实现协同防控的目的。     

新IT基础架构探讨

在互联网时代,各行业需要在"商业模式"和"体验"方面的创新,这使得IT变成了核心引擎,需要新的IT基础架构。     

PE-UHMW挤出中空吹塑设备与工艺的研究

改型设计了改性超高相对分子质量聚乙烯的挤出中空吹塑设备，设计采用了专用的挤出螺杆、机筒、模头和模具，并研究改进了吹塑工艺及生产方法，从而克服了超高相对分子质量聚乙烯的加工难点，得到了合格的吹塑制品。     

Word的高级应用——制作表单

通过实例,详细讲解用Word的窗体工具建立表单,以解决行政部门制作电子文档的空白表格时,让填写的人员方便、快捷地填写内容,又不随意修改(破坏)原有格式和原文。     

有机硅涂料的剖析

采用现代化分析手段———气相色谱 -质谱 (GC -MS)、红外光谱 (IR) ,分析出有机硅涂料的主要成分 ,并对其所用有机硅类型和偶联剂进行定性。     

铜氨废水处理与废铜液回收

简述某电子厂生产电路板过程中产生的镀铜废液，废水回收处理方法，介绍应用高质量浓度含铜废液制取工业硫酸铜与海绵铜的工艺方法和流程，铜氨废水的处理要用破络添加混凝剂沉淀后可达标排放，对调试，运行中一般故障的排除进行了论述。     

Preparation of phenolic resin derived 3-D ordered macroporous carbon

Three-dimensionally ordered long-range macroporous carbon structures were prepared using commercially available phenolic resin by utilizing sacrificial colloidal silica crystalline arrays as templates that were subsequently removed by HF etching after pyrolysis in an argon atmosphere. SEM, TEM, and BET were employed to characterize the morphology and the surface area of the porous carbon structures. The pore size (150–1000 nm) and BET surface area, which reflect pore volume (298.6 m²/g (1.32 cm³/g) ∼ 93.7 m²/g (0.12 cm³/g)), of the macroporous carbon structures produced were approximately proportional to the size (150–1000 nm) of the sacrificial silica sphere templates used (annealing temp. 550°C). The achieved 550 nm porous carbon structures were examined to function as potential catalyst carriers and were successfully impregnated with Ag or Pt-Ru on their inner walls after borohydride reduction at room temperature. In addition, porous carbon patterns were fabricated using the ‘micromolding in capillary’ technique, which has potential applications in the microreaction technology.     

基于PXI总线的LVDS数据采集存储模块的设计

鉴于SAR原始数据量大以及数据传输速率限制的问题,设计了基于PXI的雷达回波和图像数据实时记录模块。大容量数据采集记录系统基于通用的商业PC平台设计,选用FPGA作为主控芯片对电路整体逻辑进行控制;利用LVDS作为数据传输接口对数据进行接收,实现了数据采集、缓存以及通过PXI总线上传至上位机硬盘,以便后续处理。文中介绍了系统方案的总体设计,以及采集存储硬件电路的设计,并对电路的关键技术给以详细的分析。     

延迟焦化加热炉辐射管爆管技术分析

通过对大庆石化公司炼油厂延迟焦化装置炉-1辐射管爆管现象进行诊断分析,找出了发生爆管的3个原因,管材质量,炉管内存有未烧净的焦子,加工的原料发生变化,并逐个进行分析,提出了保证加热炉长周期平稳生产的措施。     

A new CVD reactor for semiconductor film deposition

The concept and design of a new chemical vapor deposition (CVD) reactor is presented for both epitaxial and nonepitaxial film deposition in semiconductor processing. The reactor is designed in such a way that a stagnant semiconductor source fluid of uniform concentration is provided for the film deposition without causing free or forced convection. The supply of the source gas for the deposition is by diffusion through a porous material such as quartz or graphite. Compared to the low pressure CVD (LPCVD) reactor with mounted wafer configuration, the new reactor should give a better film thickness uniformity and about an order of magnitude reduction in the amount of the source gas required. Further, at least for polycrystalline silicon deposition, the deposition rate can be much higher than is currently practiced with the LPCVD reactor. Design equations for the reactor are given. Details on the design for the polycrystalline silicon deposition are also given.